Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films

Thin films of ZnWO4, a promising photocatalytic and scintillator material, were deposited for the first time using reactive dual magnetron sputtering procedure. A ZnO target was operated an RF signal, W DC signal. The power on changed so that it would match rate at 25 W. effects process parameters characterized optical spectroscopy, X-ray diffraction, scanning electron microscopy, including energy dispersive spectroscopy as well photoelectron spectroscopy. It found stoichiometric microcrystalline ZnWO4 thin could be obtained, by operating during procedure 55 post-annealing resulting least 10 h 600 °C. As FTO coated glass substrates used, annealing led to incorporation Na, in n+ doped films.